本品采用CVD法制成,比传统烧结法在纯度、质量等各方面都优越数倍。
在使用寿命上也大大长于烧结法Sic。施罗森秉承“只售原装正品,不售假冒仿货”的经营理念,常年备有大量现货库存,货期稳定。欢迎广大客户来电咨询。
销售部电话: +86-510-81880058 业务QQ:1484298574 邮箱:cherry.wang@solutx.com
手机: +86-13357906205 网站:www.solutx.com
产品参考信息如下:
概要(General)
- 气孔率 0%
- only SiC (7N)
-均匀大小的结晶粒
-可适用于所有工艺
Diffusion : side dummy wafer (poly, nitride, oxide), fill dummy wafer.
CVD process : dummy wafer, monitoring wafer
Etch process : monitoring wafer
特征(Features):
- Reduced wafer reclaiming and dummy wafer cleaning.
- Strong resistance for corrosion by chemical and acid→Recycling.
- Super High purity→ Produced SiC wafer by CVD method.
产品类型(Type):
- Opaque type (general) →reduced error by photo sensor.
- Translucent type.
- Polished SiC wafer for monitoring in Poly Si, SiO2 and SiN2 process.
尺寸(Typical size):
- 12inches , 8inches, 6inches – other sizes are available .
CVD bulk SiC的应用:
如有需要,请联系我们。